Publication

Byline

Location

US Patent Issued to SPTS Technologies on Sept. 22 for "Method of operating a PVD apparatus" (British Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,577, issued on Sept. 22, was assigned to SPTS Technologies Ltd. (Newport, Great Britain). "Method of operating a PVD apparatus" was invent... और पढ़ें


US Patent Issued to Applied Materials on Sept. 22 for "Ion implantation for increased adhesion with resist material" (California, New York, Massachusetts Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,578, issued on Sept. 22, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Ion implantation for increased adhesion with resis... और पढ़ें


US Patent Issued to DISCO on Sept. 22 for "Processing method of bonded wafer" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,579, issued on Sept. 22, was assigned to DISCO Corp. (Tokyo). "Processing method of bonded wafer" was invented by Hayato Tanaka (Tokyo) an... और पढ़ें


US Patent Issued to International Business Machines on Sept. 22 for "Self-aligned litho-etch-litho-etch mandrel cut process for advanced FINFET interconnect" (New York Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,580, issued on Sept. 22, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Self-aligned litho-etch-litho-etch mandrel... और पढ़ें


US Patent Issued to Canon on Sept. 22 for "Wafer dicing method and liquid ejection head" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,581, issued on Sept. 22, was assigned to Canon K.K. (Tokyo). "Wafer dicing method and liquid ejection head" was invented by Takashi Teraga... और पढ़ें


US Patent Issued to SHIN-ETSU HANDOTAI on Sept. 22 for "Method of cleaning silicon wafer, method of manufacturing silicon wafer, and silicon wafer" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,582, issued on Sept. 22, was assigned to SHIN-ETSU HANDOTAI Co. LTD. (Tokyo). "Method of cleaning silicon wafer, method of manufacturing s... और पढ़ें


US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 22 for "Semiconductor devices and methods of manufacture" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,583, issued on Sept. 22, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Semiconductor devices and methods... और पढ़ें


US Patent Issued to HANWHA PRECISION MACHINERY on Sept. 22 for "Modularized bonding apparatus" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,584, issued on Sept. 22, was assigned to HANWHA PRECISION MACHINERY Co. LTD. (Changwon-si, South Korea). "Modularized bonding apparatus" w... और पढ़ें


US Patent Issued to Tokyo Electron on Sept. 22 for "Wafer cleaning method and system using heated functional plate" (New York Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,585, issued on Sept. 22, was assigned to Tokyo Electron Ltd. (Tokyo). "Wafer cleaning method and system using heated functional plate" was... और पढ़ें


US Patent Issued to EBARA on Sept. 22 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,586, issued on Sept. 22, was assigned to EBARA Corp. (Tokyo). "Substrate processing method and substrate processing apparatus" was invente... और पढ़ें